Atomic Force Microscopy, AFM Analysis

Atomic Force Microscopy (AFM Analysis), provides images with atomic or near-atomic-resolution surface topography, capable of quantifying surface roughness of samples down to the angstrom-scale. In addition to presenting a surface image, AFM can also provide quantitative measurements of feature sizes, such as step heights and other dimensions. Additionally, magnetic force microscopy (MFM), which is a variation of AFM, is capable of mapping the magnetic domains of samples.

Examples of Atomic Force Microscopy applications include:

• Assessing wafers (SiO₂, GaAs, SiGe, etc.) before and after processing
• Determining processing effects (e.g. plasma treatment) on biomedical devices such as contact lenses, catheter and coated stents.
• Examining the impact of surface roughness on adhesion
• Assessing trench shape/cleanliness on patterned wafers
• Determining whether morphology is the source of surface hazes

 

 

 

 

 

 

 

 

 

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